High-yield large area MoS2 technology: Material, device and circuits co-optimization
Yu L., D. El-Damak, U. Radhakrishna, A. Zubair, D. Piedra, X. Ling, Y. Lin, Y. Zhang, Y. -H. Lee, D. Antoniadis, J. Kong, A. Chandrakasan, T. Palacios, "High-yield large area MoS2 technology: Material, device and circuits co-optimization," IEEE International Electron Devices Meeting (IEDM), Dec. 2016.